EBV 100
The OmniVac EBV 100 Electron Beam Evaporator is designed for high precision thin film growth and molecular beam epitaxy. The precisely defined vapor beam allows for a highly uniform deposition on the substrate. The deposition area is determined by the distance between source and sample and the choice of an easily exchangeable exit mask. The PS-EEV 100 power supply is designed to provide highly stable operation conditions, i.e. beam energy and filament current. A ion flux controller allows for an automated deposition using PID regulation.
EBV 100 Electron Beam Evaporator
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Temperature range |
400 – 2600 K, up to 3600 K using Mo connectors |
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Electron energy |
0 - 1500 eV |
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Max. emission current |
200 mA |
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Max. power output |
300 W |
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Filament current |
1.8 - 2.2 A, max. 2.5 A |
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Working distance |
70 - 75 mm |
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Spot diameter of evaporated material |
0.5 - 2.3 mm |
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Cooling system |
Water flow > 0.5 l/min, max. 6 bar |
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Insertion depth |
min. 190 mm |
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Mounting flange |
DN 40 CF (OD 35 mm) |
PS-EBV 100 Power Supply
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Beam energy |
Error < 1 eV, ripple < 0.5 Vpp |
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Filament current |
Error 0.1 A, ripple < 0.05 Vpp |
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Ion flux monitor |
10 nA – 100 mA, 8 ranges, 1% accuracy per range |
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Flux regulation control |
PID controller |
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Dimensions (W x H x D) |
19’’ x 133 mm x 350 mm |
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Modes |
auto (flux controlled), manual (no flux control) |
| Features: |
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high stability |
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uniform deposition |
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up to 3600 K |
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internal water cooling |
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flux monitor |
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| Related Products: |
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EEV 200 – Electron Beam Evaporator, 3 kW (DN 63 CF) |
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EEV 300 – Electron Beam Evaporator, 3-pocket evaporator (DN 40 CF) |
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