IS200
The IS 200 is a differentially pumped extractor type ion source ideally suited for sample cleaning. The low cost source’s sturdy design guarantees stable operating conditions over a long period of time, even with the use of reactive gases.
Small spot sizes and a XY-deflection unit (+/- 5 mm) also allow for cleaning SPM tips. High emission currents are provided even at low beam energies, with the primary energy range reaching from 0.2 to 3 keV and working pressures as low as 10-8 mbar. Spot size and current density depend on the distance between source and sample, where the overall length of the IS 200 can be chosen to meet the specific requirements of the concerning UHV chamber.
IS 200 Ion Source
|
Design |
Differentially pumped extractor type ion source with XY-deflection unit |
|
Primary energy range |
0.2 - 3 keV |
|
Total current |
Typically 15 μA |
|
Working pressure |
down to 10-8 mbar |
|
Spot size (FWHM) |
0.5 mm (at 30 mm working distance) |
|
Mounting flange |
DN 35 CF |
|
Insertion depth |
variable |
|
Working distance |
variable |
|
Bakeable |
up to 250°C |
PS-IS 200 Power Supply
|
Display |
Ion energy, extractor voltage, emission current, deflection voltages |
|
Dimensions (W x H x D) |
19’’ x 133 mm x 415 mm |
